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摻鋁氧化鋅薄膜的光學(xué)性能研究
摻鋁氧化鋅薄膜的光學(xué)性能研究
摘要:摻鋁氧化鋅（ZAO）是1種備受關(guān)注的新型透明導(dǎo)電薄膜材料。它的很多優(yōu)點(diǎn)顯示，它是替代目前應(yīng)用廣泛的In2O3∶Sn(ITO)薄膜的最佳薄膜材料。與In2O3∶Sn（ITO）薄膜相比，ZAO薄膜具有原材料的自然界儲(chǔ)量豐富、易于制造、成本低廉、無(wú)毒、熱穩(wěn)定性和化學(xué)穩(wěn)定性好等優(yōu)點(diǎn)，因此，其必將成為新1代透明導(dǎo)電氧化物薄膜的代表。我們采用直流磁控濺射制備技術(shù)進(jìn)行ZAO薄膜的制備實(shí)驗(yàn)。用原子力顯微鏡、臺(tái)階儀、紫外-可見(jiàn)分光光度計(jì)、橢偏儀等測(cè)試手段對(duì)制備的樣品進(jìn)行組織結(jié)構(gòu)、光學(xué)分析。
從大量的制備ZAO薄膜實(shí)驗(yàn)數(shù)據(jù)中，分析直流磁控濺射制備工藝參數(shù)對(duì)ZAO薄膜性能的影響，總結(jié)出最佳制備工藝參數(shù): 靶基距為7cm，沉積工作壓強(qiáng)保持為0.5Pa,然后調(diào)節(jié)氧氬分壓比為1%，加熱玻璃基片到200 oC，以150W左右的濺射功率進(jìn)行直流反應(yīng)磁控濺射15min左右，最后在真空環(huán)境中退火處理1小時(shí)，退火溫度為200oC。在最佳工藝條件下制備出的ZAO薄膜的主要性能為:膜厚在600nm左右，可見(jiàn)光區(qū)平均透射率為89.2%，光學(xué)性能能滿足使用的需求。
本論文主要從薄膜的結(jié)構(gòu)、光學(xué)特性變化的機(jī)理入手，為進(jìn)1步全面研究ZAO薄膜的制備、結(jié)構(gòu)特性、光學(xué)特性打下了堅(jiān)實(shí)的基礎(chǔ)，也對(duì)ZAO薄膜的實(shí)際應(yīng)用具有積極意義。
關(guān)鍵詞：ZAO薄膜，直流磁控濺射，可見(jiàn)光透射率，光學(xué)性能
The Al-doped ZnO(ZAO) thin film optical properties research
Abstract : Aluminum-doped zinc oxide (ZAO) is a new area of concern transparent conductive film. Its many advantages, it is a replacement of the current widespread use of In2O3∶Sn (ITO) films the best film material. And In2O3∶Sn (ITO) film, the film is ZAO raw materials rich in natural reserves, easy to manufacture, low-cost, nontoxic, thermal stability and good chemical stability advantages, therefore, will be the next generation of its transparent conductive oxide films representatives. We dc magnetron sputtering technique ZAO Films Preparation. Atomic force microscope, level sensor, UV-VIS spectrophotometer, ellipsometer, and other means of testing the sample preparation organizational structure, Optical analysis. Preparation from a large number of experimental data ZAO films, Analysis of DC magnetron sputtering process parameters on the performance of ZAO films, summed up best Preparation of parameters : target-substrate distance of 7 cm, sedimentary work to maintain the pressure for 0.5 Pa, and then adjusted partial pressure of oxygen and argon ratio of 1%. glass substrate heating to200oC. to about 150 W power for the sputtering DC reactive magnetron sputtering about 15 min. Finally in a vacuum environment annealing an hour, annealing temperature of200oC. In optimum conditions produced a film ZAO the main properties : 600 nm in thickness around, visible average transmission rate of 89.2%, optical properties can satisfy the demand. This paper mainly from the films structure, changes in the optical properties of the mechanism for further comprehensive study of ZAO Films Preparation, structural properties, optical properties lay a solid foundation for ZAO Films practical application of positive significance.
Keywords : ZAO film, DC magnetron sputtering, visible light transmittance, optical properties
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